Silicon (Si) sputtering targets are solid, high-density plates used as the source material in physical vapor deposition (PVD) sputtering processes to deposit thin silicon films onto substrates. This P-type variant is doped to provide positive charge carriers (holes) as the majority carriers, making it suitable for thin-film work where p-type conductivity is required. Silicon belongs to the group of semiconductor materials and is widely used in laboratory and pilot-scale research.
- Quantity: 1 piece
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- Deposition of thin silicon films for semiconductor device research
- Fabrication of layers for photovoltaic and solar cell prototyping
- Development of MEMS and microelectronic thin-film structures
- Reactive sputtering to form silicon oxide or silicon nitride coatings
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