Silicon (Si) sputtering targets are solid source plates used in physical vapor deposition (PVD) to deposit silicon thin films onto substrates. The P-type designation indicates silicon doped with acceptor impurities, which creates hole-majority electrical conduction. This material belongs to the group of semiconductor sputtering targets used in thin-film research and development.
- Quantity: 1 piece
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- Deposition of silicon thin films for semiconductor device research
- Development of photovoltaic and solar cell layers
- Prototyping of MEMS and microelectronic structures
- Fabrication of optical and protective coatings in laboratory settings
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