Silicon sputtering targets are solid, dense plates of elemental silicon used as source material in physical vapor deposition (PVD) processes, such as magnetron sputtering. The P-type designation indicates that the target is doped with acceptor impurities, so holes are the majority charge carriers. Silicon is a group IV semiconductor material widely used in electronics and thin-film research.
- Quantity: 1 piece
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- Deposition of silicon-based thin films for semiconductor device research
- Formation of silicon oxide or silicon nitride films through reactive sputtering
- Development of photovoltaic and thin-film solar cell layers
- Microelectronics and MEMS prototyping
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