Undoped silicon (Si) sputtering targets are solid, consolidated blocks of elemental silicon with no intentional dopant additions. As a semiconductor-grade metalloid, silicon serves as the source material in physical vapor deposition (PVD) processes, where atoms are ejected from the target and deposited as thin films onto substrates.
- Quantity: 1 piece
For technical specifications, Certificate of Analysis (CoA), or quotation, please contact AMI Scientific.
- Deposition of silicon thin films for semiconductor device research
- Fabrication of MEMS and microelectronic test structures
- Photovoltaic and solar cell layer development
- Silicon-based optical coatings and reactive sputtering of silicon oxide or nitride layers
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