Silicon (Si) sputtering targets are solid, undoped elemental silicon plates used as the source material in physical vapor deposition (PVD) sputtering systems. Undoped silicon is a semiconductor material, and sputtering targets of this type are used to deposit uniform silicon-based thin films onto substrates inside a vacuum chamber. Because the target composition is elemental, it offers a straightforward starting point for process development where dopant-free films are required. Nanografi materials in this category are supplied for laboratory and pilot-scale thin-film work.
- Quantity: 1 piece
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- Deposition of silicon thin films for semiconductor device research
- Fabrication of silicon layers for thin-film photovoltaic studies
- Preparation of optical and protective coatings
- Microelectronics and MEMS prototyping
- Surface and interface studies in materials science
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