Silicon (Si) sputtering targets are solid, high-purity plates of elemental silicon, a group IV semiconductor widely used in electronics and materials research. In physical vapor deposition (PVD), the target is bombarded with energetic ions so that silicon atoms are ejected and deposited onto a substrate as a thin film. This undoped grade contains no intentionally added dopant elements, which makes it a suitable starting point for studies that require pure silicon films.
- 1 piece
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- Deposition of silicon thin films for semiconductor device research
- Fabrication of silicon-based layers for photovoltaic and solar cell studies
- Preparation of optical and protective coatings in thin-film research
- Development of MEMS and microelectronic component prototypes
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