Silicon (Si) sputtering targets are solid, sputter-deposition source materials made from elemental silicon. In the undoped form, no intentional dopant is added, so the target is suited for depositing pure silicon thin films. These targets belong to the semiconductor and thin-film material group and are used with physical vapor deposition systems.
- Quantity: 1 piece
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- Deposition of silicon thin films for semiconductor device research
- Fabrication of MEMS and microelectronic layers
- Development of photovoltaic and solar cell thin-film structures
- Optical and protective coatings in materials research
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