This strontium titanate (SrTiO3) sputtering target from Nanografi is a 4'' disc, 0.250'' thick, with a purity of 99.9%. It serves as the source material for depositing SrTiO3 thin films by sputtering, where material is eroded from the target and deposited onto a substrate such as a silicon wafer.
Sputter deposition coats substrates of many shapes and sizes and gives repeatable results. A process developed at research and development scale can be scaled up to production batches covering medium to large substrate areas. Depending on the process parameters, chemical reactions may take place at the target surface, in flight or on the substrate. These parameters make the process complex, but they also give experienced users a high degree of control over film growth and microstructure.
- Thin film deposition of strontium titanate onto substrates such as silicon wafers.
- Sputter etching where strong etching anisotropy is required and selectivity is not critical.
- Material analysis by etching, for example in secondary ion mass spectrometry (SIMS), to determine composition and detect very low impurity levels.
- Studies related to space weathering, in which sputtering alters the surfaces of airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01SR22
- Material: Strontium Titanate (SrTiO3)
- Size: 4''
- Thickness: 0.250''
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