Tantalum oxide (Ta2O5) is an inorganic oxide ceramic of tantalum, widely used as a source material for physical vapor deposition. This sputtering target is designed for depositing thin films of Ta2O5 onto substrates in research and development settings. The product title also references indium, so please confirm the bonding or backing configuration with us before ordering.
- Quantity: 1 piece
Contact AMI Scientific for technical specifications, CoA, or a quotation.
- Optical thin-film coatings, such as dielectric high-refractive-index layers
- Dielectric layers in microelectronics and capacitor research
- Protective and barrier coatings studied in materials science
- Process development for sputter deposition systems
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