Tantalum oxide (Ta2O5) sputtering targets are solid ceramic oxide sources used in physical vapor deposition (PVD), a thin-film process in which target material is sputtered onto a substrate. Tantalum oxide belongs to the transition metal oxide group and is valued in research for its dielectric and optical properties. This listing includes indium, which is typically associated with the target's bonding or backing configuration. Please confirm the exact construction with AMI Scientific before use.
- Quantity: 1 piece
For technical specifications, certificate of analysis (CoA), or a quotation, please contact AMI Scientific.
- Dielectric thin films for electronic device research
- Optical coating development, such as high-refractive-index layers
- Protective and barrier layer studies in materials science
- Thin-film deposition process development in university and industrial laboratories
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