This tantalum oxide (Ta2O5) sputtering target from Nanografi is a 99.99% purity disc measuring 2'' in size with a thickness of 0.125''. It serves as the source material for sputter deposition, where material is eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputter deposition is an established way to coat substrates of many shapes and sizes with thin films. The process is repeatable, works well for small research and development projects, and can be scaled to production batches covering medium to large substrate areas.
Depending on process parameters, chemical reactions may take place at the target surface, in flight, or on the substrate. The number of adjustable parameters makes sputtering a complex technique, but it gives experienced users considerable control over film growth and microstructure. Supplied as a single piece.
- Deposition of tantalum oxide thin films onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Analytical work such as secondary ion mass spectrometry (SIMS), where material is sputtered at a constant rate and analysed to determine composition and trace impurities.
- Research and development projects that may later be scaled up to medium or large substrate areas.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.99% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01TA39
- Material: Tantalum Oxide (Ta2O5)
- Size: 2''
- Thickness: 0.125''
- Product code: NG0ST01TA39
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