Tantalum oxide (Ta2O5) sputtering targets are solid oxide ceramic source materials used in physical vapor deposition (PVD) to form thin films. Tantalum oxide belongs to the group of transition-metal oxides, valued for its high dielectric constant, optical transparency, and chemical stability. In our catalog this product is classified under nanomaterials.
- Quantity: 1 piece
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- Deposition of dielectric and high-k layers for microelectronics research
- Fabrication of optical thin films such as anti-reflective and interference coatings
- Protective and barrier coatings studied in materials science laboratories
- Development of thin-film devices in academic and industrial R&D
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