Tantalum oxide (Ta2O5) is an inorganic metal oxide ceramic from the transition metal oxide group. Sputtering targets are solid, dense disks or plates used as source material in physical vapor deposition (PVD) to deposit thin films onto substrates in a vacuum chamber. This product is supplied under the Nanografi brand.
- Quantity: 1 piece
Contact AMI Scientific for technical specifications, Certificate of Analysis (CoA), or a quotation.
- Dielectric layers for thin-film capacitor and microelectronics research
- Optical thin-film coatings in photonics and optics development
- Protective and barrier layers in materials science studies
- Resistive switching and memory device research
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