Tantalum oxide (Ta2O5) is an inorganic transition metal oxide that belongs to the family of dielectric oxide ceramics. It is widely studied for its electrical insulating behavior, optical transparency in selected wavelength ranges, and chemical stability. Sputtering targets are dense solid plates of this material used as the source in physical vapor deposition (PVD). During sputtering, energetic ions eject atoms from the target surface, which then condense onto a substrate to form uniform thin films for research and development.
- Quantity: 1 piece
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- Dielectric and high-k layer research in thin-film electronics
- Optical coating development for controlling refractive index
- Protective and barrier film studies in materials science
- Surface engineering research on oxide thin films
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