Tantalum (Ta) sputtering targets are solid, high-density metal plates made from tantalum, a refractory metal valued for its high melting point, chemical stability, and corrosion resistance. They are used in physical vapor deposition (PVD) processes, where energetic ions bombard the target surface and eject atoms that condense onto a substrate to form a thin film.
- Quantity: 1 piece
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- Deposition of tantalum and tantalum-based thin films for microelectronics research
- Diffusion barrier layers in semiconductor device development
- Corrosion-resistant and wear-resistant coatings studied in materials science
- Optical and functional coating research on glass and other substrates
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