Tantalum (Ta) sputtering targets are solid, high-density plates of the refractory transition metal tantalum. They serve as the source material in physical vapor deposition (PVD), where bombardment with energetic ions ejects atoms that condense onto a substrate to form thin films. This makes them a metal target category used in thin-film and coating research.
- Quantity: 1 piece
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- Diffusion barrier and adhesion layers in microelectronics and semiconductor research
- Thin-film capacitor and passive component development
- Protective and corrosion-resistant coatings on metal and ceramic substrates
- Optical and functional coating studies
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