Tantalum sputtering targets are solid metal plates of the refractory metal tantalum (Ta), used as the source material in physical vapor deposition (PVD) sputtering systems. As metallic targets, they belong to the metal sputtering target group and are used to deposit thin tantalum films, and reactive compound films, for research and industrial thin-film processes.
- Quantity: 1 piece
Contact AMI Scientific for technical specifications, CoA, or a quotation.
- Diffusion barrier layers in semiconductor and microelectronic device research
- Thin-film deposition for capacitor and dielectric studies, such as Ta2O5 layers formed by reactive sputtering
- Corrosion-resistant and wear-resistant coatings on laboratory and industrial components
- Thin-film research for optical and sensor device development
| Brand | — |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | — |
| Category | — |
| Pack sizes | — |
| Physical form | — |
| Storage | — |
—
—