Tantalum (Ta) sputtering targets are solid plates of a refractory transition metal, prepared as source material for physical vapor deposition (PVD). During sputtering, energetic ions bombard the target surface and eject tantalum atoms that condense onto a substrate to form thin films. Nanografi tantalum targets belong to the metal sputtering target category and are widely used in thin-film research.
- Quantity: 1 piece
For technical specifications, CoA, or quotations, please contact AMI Scientific.
- Deposition of tantalum-based barrier layers in microelectronics research
- Reactive sputtering of tantalum oxide or tantalum nitride films
- Development of optical and protective thin-film coatings
- Studies of wear-resistant and corrosion-resistant surface layers
- Thin-film capacitor and sensor device research
| Brand | — |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | — |
| Category | — |
| Pack sizes | — |
| Physical form | — |
| Storage | — |
—
—