Tantalum (Ta) sputtering targets are solid metal plates used as source material in physical vapor deposition (PVD). Tantalum is a refractory transition metal known for its high melting point, chemical stability, and corrosion resistance. In sputtering, ions bombard the target surface, ejecting atoms that condense onto a substrate to form a thin film.
- Quantity: 1 piece
Contact AMI Scientific for technical specifications, CoA, or a quotation.
- Diffusion barrier layers in microelectronics and semiconductor device research
- Thin-film resistors and capacitor electrode development
- Corrosion-resistant and protective coatings on metal and glass substrates
- Optical and functional thin-film studies in university and industrial laboratories
| Brand | — |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | — |
| Category | — |
| Pack sizes | — |
| Physical form | — |
| Storage | — |
—
—