Tantalum (Ta) sputtering targets are solid discs or plates of tantalum, a refractory transition metal known for its corrosion resistance and stable mechanical behavior. In physical vapor deposition (PVD), the target is bombarded with energetic ions so that tantalum atoms are ejected and deposited onto a substrate as a uniform thin film. They are widely used in thin-film research and development.
- Quantity: 1 piece
For technical specifications, certificate of analysis (CoA), or quotation, please contact AMI Scientific.
- Diffusion barrier layers in microelectronics and semiconductor research
- Thin-film capacitor and resistor development
- Protective and corrosion-resistant coatings on metal substrates
- Optical and functional thin-film coatings
| Brand | — |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | — |
| Category | — |
| Pack sizes | — |
| Physical form | — |
| Storage | — |
—
—