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Tin Oxide (SnO2) Sputtering Targets

Tin Oxide (SnO2) Sputtering Targets
Regular price Rp 22.639.000,00
Regular price Sale price Rp 22.639.000,00
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Tin oxide (SnO2) is a metal oxide ceramic and an n-type wide-bandgap semiconductor, widely studied as a transparent conducting oxide. Sputtering targets are dense, solid source materials used in physical vapor deposition (PVD) to produce thin films by sputtering onto a substrate. This material is typically used in thin-film research and development where controlled oxide layers are required.

  • Quantity: 1 piece

For technical specifications, CoA, or a quotation, please contact AMI Scientific.

  • Transparent conductive electrodes for displays and optoelectronic devices
  • Thin-film layers for solar cell research
  • Gas sensing film development
  • Functional oxide coatings for materials science studies

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