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Tin Oxide (SnO2) Sputtering Targets

Tin Oxide (SnO2) Sputtering Targets
Regular price Rp 18.613.000,00
Regular price Sale price Rp 18.613.000,00
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Tin oxide (SnO2) is an n-type wide-bandgap metal oxide semiconductor, widely studied as a transparent conducting oxide. Sputtering targets are dense solid source materials used in physical vapor deposition (PVD) to deposit thin films onto substrates in research and industrial coating processes.

  • Quantity: 1 piece

Contact AMI Scientific for technical specifications, CoA, or a quotation.

  • Transparent conductive electrodes for displays and photovoltaic device research
  • Gas-sensing thin films for chemical and environmental sensor development
  • Active or buffer layers in thin-film transistor studies
  • Protective and optical coatings for glass and polymer substrates

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