Tin oxide (SnO2) sputtering targets are solid, ceramic-based source materials used in physical vapor deposition (PVD) to form thin films of tin oxide. Tin oxide belongs to the metal oxide family, a class of semiconducting materials widely studied for transparent conductive and sensing coatings. During magnetron sputtering, the target is eroded by ion bombardment, and the released material deposits as a uniform film onto a substrate.
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- Transparent conductive oxide layers for display and touch-panel research
- Thin-film gas sensing studies
- Thin-film solar cell and photovoltaic device research
- Optoelectronic and electrochromic coating development
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