This Nanografi tin oxide (SnO2) sputtering target is a 2'' disc, 0.250'' thick, with a purity of 99.99%. It serves as the source material in sputter deposition systems, where atoms are eroded from the target and laid down as a thin film on a substrate such as a silicon wafer.
Sputtering works on substrates of many shapes and sizes, and the process gives repeatable results. It suits small research and development work and can be scaled up to production batches covering medium to large substrate areas.
Depending on the process parameters, chemical reactions may take place on the target surface, in flight, or on the substrate. Sputter deposition involves many variables, but these give experienced users close control over film growth and microstructure.
- Thin film deposition onto substrates such as silicon wafers.
- Sputter etching where highly anisotropic etching is needed and selectivity is not a concern.
- Materials analysis by sputtering, for example secondary ion mass spectrometry (SIMS) to determine composition and detect very low impurity levels.
- Studies related to space weathering of airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.99% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01SN20
- Material: Tin Oxide (SnO2)
- Size: 2''
- Thickness: 0.250''
- Product code: NG0ST01SN20
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