Tin oxide (SnO2) sputtering target is a solid, dense ceramic source material used in physical vapor deposition (PVD) to form thin films. Tin oxide belongs to the group of wide-bandgap n-type metal oxide semiconductors and transparent conductive oxides, valued for its electrical conductivity combined with optical transparency in the visible range.
- Quantity: 1 piece
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- Transparent conductive electrodes for flat-panel displays and touch panels
- Thin-film layers in photovoltaic and organic solar cell research
- Gas sensing layers for metal oxide semiconductor sensor development
- Thin-film transistor and semiconductor device prototyping
- Functional coatings for architectural glass and optical devices
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