Tin oxide (SnO2) is an n-type metal oxide semiconductor with a wide band gap, belonging to the transparent conducting oxide family. Nanografi sputtering targets are solid source plates used in physical vapor deposition (PVD) to deposit thin films of tin oxide onto substrates in a vacuum chamber. They are widely used in laboratory and industrial thin-film processing.
- Quantity: 1 piece
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- Transparent conductive electrodes for displays and thin-film solar cells
- Thin-film gas sensors
- Optoelectronic and thin-film transistor device research
- Catalyst and anode material studies for energy storage
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