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Nanografi

Tin Oxide (SnO2) Sputtering Targets

Tin Oxide (SnO2) Sputtering Targets
Regular price Rp 24.961.000,00
Regular price Sale price Rp 24.961.000,00
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Tin oxide (SnO2) sputtering targets are solid ceramic oxide source materials used in physical vapor deposition (PVD) to form thin films of tin oxide. SnO2 belongs to the transparent metal oxide semiconductor family and is widely studied for its optical transparency and electrical conductivity in thin-film form. Nanografi supplies this target as a nanomaterial-based sputtering source for laboratory and pilot-scale deposition research.

  • Quantity: 1 piece

Contact AMI Scientific for technical specifications, CoA, or a quotation.

  • Transparent conductive layers for display and solar cell research
  • Gas sensing films for metal oxide gas sensor development
  • Thin-film transistor and optoelectronic device research
  • Functional and protective coating studies
  • Thin-film electrode research for energy storage

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