Tin (Sn) sputtering targets are solid, dense metal plates used in physical vapor deposition (PVD) to produce thin films by sputtering. Tin is a post-transition metal valued for its conductivity, low melting behavior, and chemical reactivity in oxide and alloy films.
- Quantity: 1 piece
Contact AMI Scientific for technical specifications, CoA, or a quotation.
- Deposition of conductive and electrode thin films in electronics research
- Reactive sputtering of tin oxide films for transparent conductive and gas-sensing studies
- Lead-free solder and interconnect metallization research
- Fabrication of tin-based alloy and multilayer coatings
| Brand | — |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | — |
| Category | — |
| Pack sizes | — |
| Physical form | — |
| Storage | — |
—
—
