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Tin (Sn) Sputtering Targets

Tin (Sn) Sputtering Targets
Regular price Rp 22.639.000,00
Regular price Sale price Rp 22.639.000,00
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Tin (Sn) sputtering targets are solid, dense metal plates used in physical vapor deposition (PVD) to produce thin films by sputtering. Tin is a post-transition metal valued for its conductivity, low melting behavior, and chemical reactivity in oxide and alloy films.

  • Quantity: 1 piece

Contact AMI Scientific for technical specifications, CoA, or a quotation.

  • Deposition of conductive and electrode thin films in electronics research
  • Reactive sputtering of tin oxide films for transparent conductive and gas-sensing studies
  • Lead-free solder and interconnect metallization research
  • Fabrication of tin-based alloy and multilayer coatings

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