Titanium diboride (TiB2) sputtering targets are ceramic boride sources used in physical vapor deposition (PVD) to produce thin films. TiB2 belongs to the advanced ceramics group, a class of materials valued for its hardness, wear resistance, and electrical conductivity. Sputtering targets of this type are used to deposit uniform coatings onto substrates in research and industrial thin-film processes.
- Quantity: 1 piece
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- Hard and wear-resistant thin-film coatings for cutting tools
- Protective coatings for components exposed to abrasion
- Conductive ceramic thin films for electronic and electrode research
- Materials research on boride-based thin films by PVD sputtering
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