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Nanografi

Titanium Boride (TiB2) Sputtering Targets

Titanium Boride (TiB2) Sputtering Targets
Regular price Rp 23.838.000,00
Regular price Sale price Rp 23.838.000,00
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Titanium diboride (TiB2) is a refractory ceramic from the transition metal boride group. It is valued for its hardness, high melting point, and good electrical conductivity. Sputtering targets are solid, dense plates used in physical vapor deposition (PVD) to deposit thin films onto substrates in a controlled vacuum process.

  • 1 piece

For technical specifications, Certificate of Analysis (CoA), or a quotation, please contact AMI Scientific.

  • Hard, wear-resistant protective coatings for cutting tools and machine components
  • Thin-film research on mechanical and tribological properties of boride coatings
  • Electrode and diffusion barrier layer development in electronic thin-film studies
  • Functional coating experiments in materials science laboratories

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