Titanium boride (TiB2) sputtering targets are solid, sintered source materials used in physical vapor deposition (PVD) processes such as magnetron sputtering. TiB2 belongs to the group of refractory transition metal borides, ceramic materials known for their hardness and chemical stability. These targets supply titanium and boron to form thin films on substrates for research and industrial use.
- Quantity: 1 piece
For technical specifications, Certificate of Analysis (CoA), or quotations, please contact AMI Scientific.
- Hard and wear-resistant thin-film coatings on tools and mechanical components
- Research on refractory ceramic and boride thin films
- Electrode and diffusion barrier layer studies in thin-film electronics
- Protective coatings for components exposed to high temperatures or corrosive environments
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