Titanium dioxide (TiO2) sputtering targets are solid oxide ceramic targets used in physical vapor deposition (PVD) to produce thin films. TiO2 belongs to the metal oxide group, a class of ceramic materials valued for its optical and dielectric properties.
- Quantity: 1 piece
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- Deposition of optical thin-film coatings for research on reflective and anti-reflective layers
- Fabrication of photocatalytic and self-cleaning thin films for surface studies
- Development of dielectric and buffer layers in electronic and photovoltaic device research
- Sputter-deposition studies of metal oxide films on various substrates
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