Titanium dioxide (TiO2) sputtering targets are solid ceramic source plates from the metal oxide group. They are used in physical vapor deposition (PVD) to deposit thin films of TiO2 onto substrates in a vacuum chamber. The listing also references indium, which may relate to how the target is bonded to its backing plate; please confirm this detail with AMI Scientific before ordering.
- Quantity: 1 piece
Contact AMI Scientific for technical specifications, Certificate of Analysis (CoA), or a quotation.
- Deposition of optical thin-film coatings for research on anti-reflective and interference layers
- Preparation of photocatalytic TiO2 films for surface and environmental research
- Fabrication of dielectric and oxide layers in thin-film electronics research
- Development of functional coatings for materials science and surface engineering studies
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