Titanium dioxide (TiO2) sputtering targets are dense ceramic source materials used in physical vapor deposition (PVD) to produce thin films. TiO2 belongs to the metal oxide family, a group of ceramics widely studied for their optical, dielectric, and photocatalytic behavior. This listing specifies indium in its title, which typically refers to indium bonding of the target to its backing plate.
- Quantity: 1 piece
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- Optical thin-film coatings, including anti-reflective and high-refractive-index layers
- Photocatalytic and self-cleaning surface research
- Dielectric and transparent layers in electronic device prototyping
- Thin-film solar cell and sensor development
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