Titanium dioxide (TiO2) sputtering targets are oxide ceramic target materials used in physical vapor deposition (PVD) to form thin films on substrates. This product is listed as an indium-containing variant, so confirm the exact composition with AMI Scientific before use. TiO2 belongs to the metal oxide group and is widely studied for its functional surface and optical properties.
- Quantity: 1 piece
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- Thin-film deposition for optical coating research
- Photocatalytic and self-cleaning surface studies
- Dielectric and transparent oxide layer development
- Sensor and electronic device prototyping
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