Titanium dioxide (TiO2) sputtering targets are solid, high-density oxide ceramic sources used in physical vapor deposition to produce thin films. TiO2 belongs to the metal oxide group, valued for its optical, dielectric, and photocatalytic properties. The listing also references indium, so please confirm the target bonding and backing details with AMI Scientific before ordering.
- Quantity: 1 piece
Contact AMI Scientific for technical specifications, CoA, or a price quotation.
- Deposition of optical coating layers in thin-film research
- Fabrication of photocatalytic and self-cleaning surface films
- Development of dielectric layers for electronic and sensor devices
- Materials research on oxide thin films using RF or DC sputtering systems
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