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Titanium Dioxide (TiO2) Sputtering Targets, indium, Purity: 99.99%, Size: 4'', Thickness: 0.125'', Beige to White - Nanografi Advanced Materials

Titanium Dioxide (TiO2) Sputtering Targets, indium, Purity: 99.99%, Size: 4'', Thickness: 0.125'', Beige to White - Nanografi Advanced Materials
Regular price Rp 79.146.000,00
Regular price Sale price Rp 79.146.000,00
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Titanium dioxide (TiO2) sputtering targets are solid ceramic metal-oxide plates used as the source material in physical vapor deposition to form thin films. This product is a beige-to-white target with a stated purity of 99.99%, a 4-inch size, and a 0.125-inch thickness. The listing also names indium as a component. Indium is commonly used as a bonding layer for such targets, so please confirm the exact construction with our team. Titanium dioxide belongs to the oxide ceramics group and is widely studied for its optical and photocatalytic properties.

  • Quantity: 1 piece

Contact AMI Scientific for technical specifications, CoA, or a quotation.

  • Deposition of optical and anti-reflective thin films in coating research
  • Photocatalytic coating development on glass and other substrates
  • Dielectric layer fabrication for electronic and semiconductor device studies
  • Surface engineering research on functional oxide films

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