Titanium dioxide (TiO2) sputtering targets are solid source materials used in physical vapor deposition (PVD) to deposit thin films of titanium dioxide onto substrates. TiO2 belongs to the metal oxide family, a group valued for its optical, dielectric, and photocatalytic properties. This item is supplied as a single piece for laboratory and development use.
- Quantity: 1 piece
For technical specifications, CoA, or quotations, please contact AMI Scientific.
- Optical thin-film coatings, such as anti-reflective and interference layers
- Photocatalytic and self-cleaning surface films
- Dielectric layers in electronic and sensor device research
- Thin-film solar cell and photoelectrochemical studies
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