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Titanium Dioxide (TiO2) Sputtering Targets

Titanium Dioxide (TiO2) Sputtering Targets
Regular price Rp 23.180.000,00
Regular price Sale price Rp 23.180.000,00
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Titanium dioxide (TiO2) is an inorganic metal oxide ceramic belonging to the functional oxide material group. It is widely used as a sputtering target in physical vapor deposition (PVD) to form uniform thin films on various substrates for research and development.

  • Quantity: 1 piece

Contact AMI Scientific for technical specifications, CoA, or a quotation.

  • Deposition of photocatalytic thin films for surface and environmental studies
  • Optical coatings and high-refractive-index layers in thin-film optics
  • Dielectric and functional oxide layers in electronic device prototyping
  • Thin-film sensor and coating development in academic and industrial laboratories

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