Titanium dioxide (TiO2) sputtering targets are oxide ceramic source materials used in physical vapor deposition (sputtering) to form thin films of titanium dioxide on substrates. TiO2 belongs to the family of functional metal oxides and is valued for its optical, dielectric, and photocatalytic properties, which makes these targets a common choice for thin-film research and development.
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- Photocatalytic and self-cleaning coating research
- Optical thin films, such as high-refractive-index and anti-reflective layers
- Dielectric layers in electronic and microelectronic device studies
- Functional layers for dye-sensitized and other thin-film solar cell research
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