Titanium dioxide (TiO2) sputtering targets are oxide ceramic sources used in physical vapor deposition (PVD) to form TiO2 thin films on substrates. TiO2 belongs to the transition metal oxide family and is widely studied for its optical, dielectric, and photocatalytic properties. These targets are supplied as solid plates that are eroded by ion bombardment in a sputtering chamber, releasing material that condenses as a uniform film.
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- Optical thin-film coatings, such as anti-reflective and dielectric layers
- Photocatalytic and self-cleaning surface film research
- Dielectric and buffer layers in electronic and photonic device studies
- Functional layers in energy research, including solar cell and perovskite device development
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