This titanium dioxide (TiO2) sputtering target is a source material for depositing TiO2 thin films by sputtering. It has a purity of 99.9%, a size of 2'' and a thickness of 0.125'', with a grey to black appearance. Each item is supplied as one piece.
Sputter deposition can coat many different substrate shapes and sizes. The process is repeatable, so work started in small research and development projects can be scaled toward production batches covering medium to large substrate areas.
Depending on the process parameters, the chemical reaction may take place on the target surface, in flight or on the substrate. The large number of adjustable parameters makes sputtering a complex technique, but it gives experienced users considerable control over film growth and microstructure.
- Deposition of thin films onto substrates such as silicon wafers by eroding material from the target.
- Sputter etching where a high degree of etching anisotropy is required and selectivity is not critical.
- Material analysis by etching, as in secondary ion mass spectrometry (SIMS), to determine composition and detect very low impurity concentrations.
- Research related to space weathering, the sputtering process that alters airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01TI56
- Material: Titanium Dioxide (TiO2)
- Size: 2''
- Thickness: 0.125''
- Color: Grey to Black
- Product code: NG0ST01TI56
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