Titanium dioxide (TiO2) sputtering targets are dense oxide ceramic plates used as source material in physical vapor deposition. During sputtering, energetic ions eject material from the target surface, which then condenses onto a substrate to form a thin TiO2 film. TiO2 belongs to the metal oxide ceramic group and is widely studied for its optical and functional properties.
- Quantity: 1 piece
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- Deposition of optical thin films, such as anti-reflective and interference coatings, in materials research
- Research on photocatalytic and self-cleaning surface coatings
- Development of dielectric layers for electronic and semiconductor device studies
- Fabrication of thin-film layers for gas sensing and energy conversion research
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