This titanium dioxide (TiO2) sputtering target from Nanografi is a 2'' disc, 0.250'' thick, with a purity of 99.9% and a grey to black appearance. It serves as the source material for depositing TiO2 thin films by sputtering, where material is eroded from the target and deposited onto a substrate such as a silicon wafer.
Sputter deposition coats substrates of many shapes and sizes and gives repeatable results. A process developed at the research and development scale can be scaled up to production batches covering medium to large substrate areas.
Depending on the process parameters, chemical reactions may take place on the target surface, in flight or on the substrate. These many variables make sputtering a complex technique, but they also give experienced users considerable control over film growth and microstructure.
- Deposition of titanium dioxide thin films onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Compositional analysis by secondary ion mass spectrometry (SIMS), including detection of very low impurity concentrations.
- Scaling sputtering processes from research and development work to medium and large substrate production batches.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | Grey to Black |
| Storage | — |
- Product code: NG0ST01TI58
- Material: Titanium Dioxide (TiO2)
- Size: 2''
- Thickness: 0.250''
- Product code: NG0ST01TI58
—
—