Titanium dioxide (TiO2) sputtering targets are solid source materials, typically in ceramic form, used in physical vapor deposition (PVD) to deposit thin films of titanium dioxide onto substrates. Titanium dioxide belongs to the inorganic metal oxide family and is valued for its optical, dielectric, and photoactive properties. Sputtering targets are commonly supplied as plates or discs, often mounted on backing plates for use in vacuum sputtering systems.
- 1 piece
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- Photocatalytic and self-cleaning thin film coatings
- Optical thin films, such as anti-reflective and high-refractive-index layers
- Dielectric layers in electronic and sensor device research
- Thin-film solar cell and dye-sensitized solar cell research
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