Titanium dioxide (TiO2) sputtering targets are solid, dense discs or plates of a metal oxide ceramic material used in physical vapor deposition (PVD). During magnetron sputtering, energetic ions bombard the target surface and eject atoms that condense onto a substrate, forming thin films. Sputtering targets are manufactured to serve as the cathode in deposition systems, and the target material largely determines the composition of the resulting film. TiO2 belongs to the functional oxide ceramics group, valued for its optical, dielectric, and photoactive properties.
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- Optical thin films, including high-refractive-index and antireflective coatings
- Photocatalytic and self-cleaning coating research
- Dielectric layers in electronic device and sensor research
- Thin-film solar cell and photovoltaic development
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