Titanium dioxide (TiO2) sputtering targets are oxide source materials used in physical vapor deposition (PVD) to produce thin films through sputtering. TiO2 belongs to the metal oxide ceramic family and is widely studied for its optical, dielectric, and photoactive properties. Under vacuum, the target releases titanium and oxygen species onto a substrate, enabling controlled film growth for research and development.
- 1 piece
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- Photocatalytic and self-cleaning thin-film research
- Optical coatings, including high-refractive-index layers
- Dielectric layers for electronic and semiconductor device studies
- Electrode and interlayer development for energy conversion research
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