This titanium dioxide (TiO2) sputtering target is a 3'' target with a thickness of 0.250'' and a purity of 99.9%. It is grey to black in colour and serves as the source material for depositing TiO2 thin films in sputtering systems.
Sputtering lets users coat thin films of many materials onto substrates of different shapes and sizes. Results are repeatable, and a process developed on a small research scale can be carried forward to production batches covering medium to large substrate areas.
Depending on how the process is set up, the chemical reaction may take place on the target surface, in flight or on the substrate. The number of adjustable parameters makes sputter deposition demanding, but it also gives experienced users close control over film growth and microstructure.
- Thin film deposition, where material is eroded from the target onto a substrate such as a silicon wafer.
- Sputter etching in semiconductor work, where high etching anisotropy is required and selectivity is not critical.
- Material analysis by etching away the target, as in secondary ion mass spectrometry (SIMS), to determine composition and detect very low impurity levels.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01TI62
- Material: Titanium Dioxide (TiO2)
- Size: 3''
- Thickness: 0.250''
- Colour: Grey to Black
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