Titanium dioxide (TiO2) sputtering targets are oxide ceramic target materials used in physical vapor deposition (sputtering) to deposit thin films of titanium dioxide onto substrates. As a metal oxide within the ceramic material group, TiO2 is valued for its optical and photoactive properties. The target serves as the source material that is sputtered within a vacuum chamber to form the film.
- 1 piece
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- Optical thin-film coating research
- Photocatalytic and self-cleaning surface studies
- Dielectric and passivation layer development
- Photovoltaic and dye-sensitized solar cell layer research
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