This Nanografi titanium dioxide (TiO2) sputtering target is a 4'' diameter disc, 0.125'' thick, with a purity of 99.9% and a grey to black appearance. It serves as the source material for depositing TiO2 thin films by sputtering.
Sputter deposition can coat many substrate shapes and sizes. The process is repeatable, works for small research and development projects, and can be scaled to production batches covering medium to large substrate areas.
Depending on the process settings, chemical reactions may take place on the target surface, in flight, or on the substrate. The many adjustable parameters make sputtering a complex technique, but they give experienced users close control over film growth and microstructure.
- Deposition of thin films onto substrates such as silicon wafers by sputtering.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Analytical work such as secondary ion mass spectrometry (SIMS), where material is sputtered at a constant rate to determine composition and detect trace impurities.
- Research related to space weathering, in which sputtering alters the surfaces of airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01TI64
- Material: Titanium Dioxide (TiO2)
- Size: 4''
- Thickness: 0.125''
- Color: Grey to Black
- Product code: NG0ST01TI64
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