Sputtering targets are solid source materials used in physical vapor deposition (PVD) to form thin films on substrates. Titanium dioxide (TiO2) is a metal oxide ceramic from the transition metal oxide group, valued for its optical and photoactive properties. TiO2 sputtering targets provide a controlled source for depositing titanium dioxide films in laboratory and pilot-scale coating processes.
- Quantity: 1 piece
For technical specifications, CoA, or quotations, please contact AMI Scientific.
- Optical thin films such as anti-reflective and interference coatings
- Photocatalytic and self-cleaning surface layer research
- Dielectric layers for electronic and sensor device studies
- Dye-sensitized and thin-film solar cell research
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